Bis(trimethylsilyl)amine

<h2 id="synthesis-and-derivatives">Synthesis and derivatives</h2>
Bis(trimethylsilyl)amine is synthesized by treatment of <a href="/facts/Trimethylsilyl_chloride/CKlvuSgR">trimethylsilyl chloride</a> with <a href="/facts/Ammonia/MtLtJFtz">ammonia</a>:<a class="footnote-ref" id="fnref:2" href="#fn:2">2</a>

2 (CH3)3SiCl + 3 NH3 → [(CH3)3Si]2NH + 2 NH4Cl
<a href="/facts/Ammonium_nitrate/aSc96wBX">Ammonium nitrate</a> together with <a href="/facts/Triethylamine/6DjzaGGv">triethylamine</a> can be used instead.<a class="footnote-ref" id="fnref:3" href="#fn:3">3</a> This method is also useful for 15N isotopic enrichment of HMDS.

Alkali metal bis(trimethylsilyl)amides result from the <a href="/facts/Deprotonation/SmUSh369">deprotonation</a> of bis(trimethylsilyl)amine. For example, <a href="/facts/Lithium_bis(trimethylsilyl)amide/u5DQenrz">lithium bis(trimethylsilyl)amide</a> (LiHMDS) is prepared using <a href="/facts/N-Butyllithium/v4Rz4Dc1">n-butyllithium</a>:

[(CH3)3Si]2NH + BuLi → [(CH3)3Si]2NLi + BuH
LiHMDS and other similar derivatives: <a href="/facts/Sodium_bis(trimethylsilyl)amide/IE8qcl4j">sodium bis(trimethylsilyl)amide</a> (NaHMDS) and <a href="/facts/Potassium_bis(trimethylsilyl)amide/HtX0nN4B">potassium bis(trimethylsilyl)amide</a> (KHMDS) are used as a non-nucleophilic bases in synthetic organic chemistry.

<h2 id="use-as-reagent">Use as reagent</h2>
Hexamethyldisilazane is employed as a reagent in many organic reactions: 
1) HMDS is used as a <a href="/facts/Reagent/c3GLInCu">reagent</a> in <a href="/facts/Condensation_reaction/wMG0F6La">condensation reactions</a> of <a href="/facts/Heterocyclic_compound/8oYSjJxY">heterocyclic compounds</a> such as in the <a href="/facts/Microwave_chemistry/nTcqokMz">microwave synthesis</a> of a <a href="/facts/Derivative_(chemistry)/JYcbLkbm">derivative</a> of <a href="/facts/Xanthine/3ARA2QCg">xanthine</a>:<a class="footnote-ref" id="fnref:4" href="#fn:4">4</a>

2) The HMDS mediated trimethylsilylation of alcohols, thiols, amines and amino acids as protective groups or for intermediary organosilicon compounds is found to be very efficient and replaced TMSCl reagent.<a class="footnote-ref" id="fnref:5" href="#fn:5">5</a> 
Silylation of <a href="/facts/Glutamic_acid/7oXbNcvu">glutamic acid</a> with excess hexamethyldisilazane and catalytic TMSCl in either refluxing <a href="/facts/Xylene/BEGggD9s">xylene</a> or <a href="/facts/Acetonitrile/fNpbvRp6">acetonitrile</a> followed by dilution with alcohol (methanol or ethanol) yields the derived lactam <a href="/facts/Pyroglutamic_acid/wh5pwznT">pyroglutamic acid</a> in good yield.

HMDS in the presence of catalytic iodine facilitates the silylation of alcohols in excellent yields.

3) HMDS can be used to silylate laboratory glassware and make it hydrophobic, or automobile glass, just as <a href="/facts/Rain-X/2ajGuRLv">Rain-X</a> does.
4) In <a href="/facts/Gas_chromatography/kwLY8vt1">gas chromatography</a>, HMDS can be used to silylate OH groups of organic compounds to increase volatility, this way enabling GC-analysis of chemicals that are otherwise non-volatile.

<h2 id="other-uses">Other uses</h2>
In <a href="/facts/Photolithography/FTHsauvy">photolithography</a>, HMDS is often used as an adhesion promoter for <a href="/facts/Photoresists/XNnIkCjU">photoresists</a>. Best results are obtained by applying HMDS from the gas phase on heated substrates.<a class="footnote-ref" id="fnref:6" href="#fn:6">6</a><a class="footnote-ref" id="fnref:7" href="#fn:7">7</a>
In <a href="/facts/Electron_microscopy/XtaBktwF">electron microscopy</a>, HMDS can be used as an alternative to <a href="/facts/Critical_point_drying/xym7I52I">critical point drying</a> during sample preparation.<a class="footnote-ref" id="fnref:8" href="#fn:8">8</a>
In <a href="/facts/Pyrolysis/h1cEegI7">pyrolysis</a>-gas chromatography-<a href="/facts/Mass_spectrometry/RH5WBHJ2">mass spectrometry</a>, HMDS is added to the analyte to create silylated diagnostic products during pyrolysis, in order to enhance detectability of compounds with polar functional groups.<a class="footnote-ref" id="fnref:9" href="#fn:9">9</a>
In <a href="/facts/Plasma-enhanced_chemical_vapor_deposition/P2uDMQ5m">plasma-enhanced chemical vapor deposition</a> (PECVD), HMDS is used as a molecular precursor as a replacement to highly flammable and corrosive gasses like SiH4, CH4, NH3 as it can be easily handled. HMDS is used in conjunction with a <a href="/facts/Plasma_(physics)/1d3btMVU">plasma</a> of various gases such as argon, helium and nitrogen to deposit SiCN thin films/coatings with excellent mechanical, optical and electronic properties.<a class="footnote-ref" id="fnref:10" href="#fn:10">10</a>

<h2 id="see-also">See also</h2>
<ul><li><a href="/facts/Hexamethyldisiloxane/UmIspJ7U">Hexamethyldisiloxane</a></li>
<li><a href="/facts/Metal_bis(trimethylsilyl)amides/dc3TUMHy">Metal bis(trimethylsilyl)amides</a></li></ul>

<h2 id="references">References</h2>

<ol>
<li id="fn:1">D.A. Armitage (1982). "9.1 - Organosilanes". Organosilicon - an overview. Comprehensive Organometallic Chemistry. pp. 1–203. doi:10.1016/B978-008046518-0.00014-3. ISBN 9780080465180. <a href="9780080465180" target="_blank">9780080465180</a> <a href="#fnref:1" class="footnote-back-ref">↩</a></li>
<li id="fn:2">Robert C. Osthoff; Simon W. Kantor (1957). "Organosilazane Compounds". Inorganic Syntheses. Inorg. Synth. Vol. 5. pp. 55–64. doi:10.1002/9780470132364.ch16. ISBN 978-0-470-13236-4. <a href="978-0-470-13236-4" target="_blank">978-0-470-13236-4</a> <a href="#fnref:2" class="footnote-back-ref">↩</a></li>
<li id="fn:3">S.V. Chernyak; Yu. G. Yatluk; A.L. Suvorov (2000). "A Simple Synthesis of Hexamethyldisilazane (Translated from Zhurnal obshcheĭ khimiĭ, Vol. 70. No. 8, 2000. p1401)". Russian Journal of General Chemistry. 70: 1313. <a href="#fnref:3" class="footnote-back-ref">↩</a></li>
<li id="fn:4">Burbiel JC, Hockemeyer J, Müller CE (2006). "Microwave-assisted ring closure reactions: Synthesis of 8-substituted xanthine derivatives and related pyrimido- and diazepinopurinediones". Beilstein J Org Chem. 2: 20. doi:10.1186/1860-5397-2-20. PMC 1698928. PMID 17067400. <a href="https://www.ncbi.nlm.nih.gov/pmc/articles/PMC1698928" target="_blank">https://www.ncbi.nlm.nih.gov/pmc/articles/PMC1698928</a> <a href="#fnref:4" class="footnote-back-ref">↩</a></li>
<li id="fn:5">Benjamin A. Anderson; Vikas Sikervar (2001). "Hexamethyldisilazane". Encyclopedia of Reagents for Organic Synthesis. doi:10.1002/047084289X.rh016. ISBN 0471936235. <a href="0471936235" target="_blank">0471936235</a> <a href="#fnref:5" class="footnote-back-ref">↩</a></li>
<li id="fn:6">Cornell NanoScale Science & Technology Facility. "CNF - Photolithography Resist Processes and Capabilities". Archived from the original on 2019-09-07. Retrieved 2008-01-29. <a href="https://web.archive.org/web/20190907203828/http://www.cnf.cornell.edu/cnf_process_photo_resists.html#hmds" target="_blank">https://web.archive.org/web/20190907203828/http://www.cnf.cornell.edu/cnf_process_photo_resists.html#hmds</a> <a href="#fnref:6" class="footnote-back-ref">↩</a></li>
<li id="fn:7">"YES Prime Oven | Stanford Nanofabrication Facility". snfexfab.stanford.edu. Stanford Nanofabrication Facility. <a href="https://snfexfab.stanford.edu/snf/operating-instructions/yes-prime-oven" target="_blank">https://snfexfab.stanford.edu/snf/operating-instructions/yes-prime-oven</a> <a href="#fnref:7" class="footnote-back-ref">↩</a></li>
<li id="fn:8">Bray DF, Bagu J, Koegler P (1993). "Comparison of hexamethyldisilazane (HMDS), Peldri II, and critical-point drying methods for scanning electron microscopy of biological specimens". Microsc. Res. Tech. 26 (6): 489–95. doi:10.1002/jemt.1070260603. PMID 8305726. S2CID 26050695. <a href="/wiki/Doi_(identifier)" target="_blank">/wiki/Doi_(identifier)</a> <a href="#fnref:8" class="footnote-back-ref">↩</a></li>
<li id="fn:9">Giuseppe Chiavari; Daniele Fabbri & Silvia Prati (2001). "Gas chromatographic–mass spectrometric analysis of products arising from pyrolysis of amino acids in the presence of hexamethyldisilazane". Journal of Chromatography A. 922 (1–2): 235–241. doi:10.1016/S0021-9673(01)00936-0. PMID 11486868. <a href="/wiki/Doi_(identifier)" target="_blank">/wiki/Doi_(identifier)</a> <a href="#fnref:9" class="footnote-back-ref">↩</a></li>
<li id="fn:10">P. Jedrzejowski; J. Cizek; A. Amassian; J. E. Klemberg-Sapieha; J. Vlcek; L. Martinu (2004). "Mechanical and optical properties of hard SiCN coatings prepared by PECVD". Thin Solid Films . 447–448: 201–207. Bibcode:2004TSF...447..201J. doi:10.1016/S0040-6090(03)01057-5. <a href="/wiki/Thin_Solid_Films" target="_blank">/wiki/Thin_Solid_Films</a> <a href="#fnref:10" class="footnote-back-ref">↩</a></li>
</ol>

Bis(trimethylsilyl)amine open-in-new

Bis(trimethylsilyl)amine