Hybrid physical–chemical vapor deposition

<p>Hybrid physical–chemical vapor deposition (HPCVD) is a <a href="/facts/Thin-film_deposition/nSeoUT4Q">thin-film deposition</a> technique, that combines <a href="/facts/Physical_vapor_deposition/RNcNPVjU">physical vapor deposition</a> (PVD) with <a href="/facts/Chemical_vapor_deposition/7khLxeU5">chemical vapor deposition</a> (CVD). 
</p><p>For the instance of <a href="/facts/Magnesium_diboride/fsgNsNPP">magnesium diboride</a> (MgB2) thin-film growth, HPCVD process uses <a href="/facts/Diborane/k7egwbPf">diborane</a> (B2H6) as the boron <a href="/facts/Precursor_(chemistry)/dUw8Mx2Y">precursor</a> gas, but unlike conventional CVD, which only uses gaseous sources, heated bulk magnesium pellets (99.95% pure) are used as the Mg source in the deposition process. Since the process involves <a href="/facts/Chemical_decomposition/4X3oxvhb">chemical decomposition</a> of precursor gas and <a href="/facts/Evaporation_(deposition)/kdu4uIbJ">physical evaporation</a> of metal bulk, it is named as hybrid physical–chemical vapor deposition.
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Hybrid physical–chemical vapor deposition open-in-new

Hybrid physical–chemical vapor deposition