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Resolution enhancement technologies
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<p> Resolution enhancement technologies are methods used to modify the <a href="/facts/Photomask/xCdRhIod">photomasks</a> in the <a href="/facts/Photolithography/FTHsauvy">lithographic processes</a> used to make <a href="/facts/Integrated_circuit/fjn6vg7C">integrated circuits</a> (ICs or "chips") to compensate for limitations in the <a href="/facts/Optical_resolution/TcLkPYFw">optical resolution</a> of the projection systems. These processes allow the creation of features well beyond the limit that would normally apply due to the <a href="/facts/Angular_resolution/wJarPBWF">Rayleigh criterion</a>. Modern technologies allow the creation of features on the order of 5 <a href="/facts/Nanometer/a98sjHyu">nanometers</a> (nm), far below the normal resolution possible using <a href="/facts/Deep_ultraviolet/kncBUqn5">deep ultraviolet</a> (DUV) light. </p>